45 nanometer (45 nm) is the
buzzword of choice (2007-2008) for an
advanced
semiconductor manufacturing process that
Intel used for mass
chip
production, starting in late 2007. The 45 nanometer manufacturing process uses new
materials, including hafnium-based high-k gate
dielectrics and metal gates, to
reduce electrical current leakage in transistors.
Contrast with
90 nanometer.